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High-refractive-index gratings for spectroscopic and laser applications

: Zeitner, Uwe Detlef; Fuchs, Frank; Kley, Ernst-Bernhard; Tünnermann, Andreas


Chang-Hasnain, C.J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
High Contrast Metastructures III : February 2014, San Francisco, California, United States
Bellingham, WA: SPIE, 2014 (Proceedings of SPIE 8995)
ISBN: 978-0-8194-9908-0
Paper 899504
Conference "High Contrast Metastructures" <3, 2014, San Francisco/Calif.>
Conference Paper
Fraunhofer IOF ()
grating; e-beam lithography; atomic-layer-deposition; pulse compression; spectroscopy

Fabrication of high performance gratings may significantly benefit from the use of high index materials such as Ta2O5, TiO 2 or Al2O3. However, these materials can typically not be patterned with the required quality by common etching processes. To overcome this limitation we developed novel grating fabrication technologies based on a combination of conventional lithography with Atomic-Layer-Deposition. For that the basic structure of the grating is first realized in a fused-silica substrate or a SiO2-layer. This template is then functionalized by an ALD-coating in a specific pre-defined manner. The new approach opens up a huge variety of new options for the realization of gratings whose fabrication would otherwise not be possible.