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Scattering reduction through oblique multilayer deposition

 
: Trost, Marcus; Herffurth, Tobias; Schröder, Sven; Duparré, Angela; Tünnermann, Andreas

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Applied optics 53 (2014), No.4, pp.A197-A204
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
English
Journal Article
Fraunhofer IOF ()

Abstract
Scattering from multilayer coatings depends on the roughness of each interface as well as their cross-correlation properties. By depositing thin film coatings under oblique incidence, the cross-correlation properties can be specifically adapted and consequently also the scattering characteristics. This will be illustrated for Mo/Si multilayers, for which a scattering reduction of more than 30% can be achieved. The characterization techniques used comprise of cross-sectional transmission electron microscopy, atomic force microscopy, and angle-resolved light scattering measurements at a wavelength of 13.5 nm.

: http://publica.fraunhofer.de/documents/N-280073.html