Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Towards automatic mask and source optimization for optical lithography

 
: Erdmann, A.; Fühner, T.; Schnattinger, T.; Tollkühn, B.

:

Smith, B.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical microlithography XVII. Vol.2 : 24 - 27 February 2004, Santa Clara, California, USA
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5377)
ISBN: 0-8194-5290-4
pp.646-657
Conference "Optical Microlithography" <17, 2004, Santa Clara/Calif.>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-27807.html