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Elektrostatisches Halteelement

Electrostatic holding element for processing items e.g. wafer, has base portion made of carbon fibers arranged and/or oriented in plane parallel to support plane for items, which comprises isotropic thermal expansion characteristics
 
: Kalkowski, Gerhard; Risse, S.; Peschel, Thomas

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Frontpage ()

DE 102012002646 A1: 20120209
German
Patent, Electronic Publication
Fraunhofer IOF ()

Abstract
The holding element has electrodes (4,4') which are formed on the surface of a base portion (1) and are covered by the dielectric layer. The dielectric layer is used as a support for the to-be-processed items. The base portion is formed of carbon fiber reinforced silicon carbide (SiC). The carbon fibers embedded in the SiC are arranged and/or oriented in one plane which is aligned parallel to the support plane for the to-be-processed items. The base portion comprises approximately isotropic thermal expansion characteristics, at room temperature.

: http://publica.fraunhofer.de/documents/N-270933.html