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Sputtertarget und seine Verwendung
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Title
Sputtertarget und seine Verwendung
Date Issued
2011
Author(s)
Herzog, A.
Schultheis, M.
Schneider-Betz, S.
Schlott, M.
Dewald, Wilma
Patent No
2011-2584062
Abstract
A sputtering target contains a material of component having two or more phases, in which one phase is formed by metal oxide forming matrix and embedded in elemental metal or metal alloy.
Language
de
Institute
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST
Link
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=EP&NR=2584062A1
Patenprio
EP 2011-2584062 A1: 20111019