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Sputtertarget und seine Verwendung

Sputter target and its application
 
: Herzog, A.; Schultheis, M.; Schneider-Betz, S.; Schlott, M.; Dewald, Wilma

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Frontpage ()

EP 2011-2584062 A1: 20111019
German
Patent, Electronic Publication
Fraunhofer IST ()

Abstract
A sputtering target contains a material of component having two or more phases, in which one phase is formed by metal oxide forming matrix and embedded in elemental metal or metal alloy.

: http://publica.fraunhofer.de/documents/N-270835.html