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Anti-reflection-coating thickness measurements on textured silicon surfaces: Evaluation and accuracy of different measurement techniques

: Krieg, A.; Greulich, J.; Tondorf, M.; Rein, S.

Fulltext urn:nbn:de:0011-n-2669394 (395 KByte PDF)
MD5 Fingerprint: 58db0d6ce96a9c84f8b8dcf5adffff31
Created on: 29.11.2013

Mine, A. ; European Commission:
28th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2013. Proceedings. DVD-ROM : 30 September to 04 October 2013, Paris, France
München: WIP-Renewable Energies, 2013
ISBN: 3-936338-33-7
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <28, 2013, Paris>
Conference Paper, Electronic Publication
Fraunhofer ISE ()
PV Produktionstechnologie und Qualitätssicherung; Silicium-Photovoltaik; Oberflächen: Konditionierung; Passivierung; Lichteinfang; Messtechnik und Produktionskontrolle; Antireflection-Coating; texture; control; measurement

The accuracy and reliability of different techniques for inline quality control of antireflection coatings (ARC) on industrial relevant surfaces are analyzed and rules to improve the accuracy of the systems are derived. For this, four systems are compared with respect to the setup and the way of ARC thickness calculation. Raw data and measured thicknesses are evaluated with respect to a reference system, to identify for each surface texture the system which is suited best and to identify the physical reasons for deviations. Angle-dependent simulations and measurements of the spectral reflectance on monocrystalline wafers with a pyramidally-etched surface reveal that different angle corrections for mc-Si and Cz-Si are required. Besides evaluating the spectral position of the reflectance minimum, a least-squares fit of the spectral reflectance of partially textured Cz-Si is presented and evaluated.