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Accuracy of wafer level alignment with substrate conformal imprint lithography

Presentation held at 12th International Conference on Nanoimprint and Nanoprint Technology (NNT), October 21 - 23, 2013, Barcelona, Spain
 
: Fader, Robert; Rumler, M.; Rommel, M.; Bauer, A.J.; Frey, L.; Verschuuren, M.A.; Laar, R. van de; Ji, R.; Schömbs, U.

:
presentation urn:nbn:de:0011-n-2649286 (581 KByte PDF)
MD5 Fingerprint: 4e4c3e0446fea00dc001d277e76408b0
Created on: 6.11.2013


2013, 23 Folien
International Conference on Nanoimprint & Nanoprint Technology (NNT) <12, 2013, Barcelona>
English
Presentation, Electronic Publication
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-264928.html