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  4. In-situ spectroscopic ellipsometry and plasma control for large-scale magnetron sputter deposition processes
 
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2000
Conference Paper
Title

In-situ spectroscopic ellipsometry and plasma control for large-scale magnetron sputter deposition processes

Abstract
Different plasma control systems are applied for the stabilization of the reactive magnetron sputter process within the transition mode with power densities of up to 6 W/cm². Ex-situ spectroscopic ellipsometry and spectral photometry are used for analyzing low-e coatings on glass. Ex-situ/in-line ellipsometry on a large area coater was applied to monitor the film thicknesses of completed low-e coatings on moving substrates. A new optical measurement system is presented which was applied for in-situ/in-line spectroscopic ellipsometry. The thickness of different low-e coatings were monitored during the deposition process. Process drift as well as product changes were monitored with the setup.
Author(s)
Vergöhl, M.
Malkomes, N.
Matthée, T.
Bräuer, G.
Mainwork
Society of Vacuum Coaters. 43rd Annual Technical Conference 2000. Proceedings  
Conference
Society of Vacuum Coaters (Annual Technical Conference) 2000  
Language
English
Fraunhofer-Institut für Schicht- und Oberflächentechnik IST  
Keyword(s)
  • reactive magnetron sputtering

  • large area coating

  • in-situ ellipsometry

  • process control

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