Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Plasma-assisted deposition at atmospheric pressure using dielectric barrier discharges
| Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 43rd Annual Technical Conference 2000. Proceedings : April 15-20, 2000, Denver, Colorado
Albuquerque: SVC, 2000
ISSN: 0737-5921
pp.100-106 |
| Society of Vacuum Coaters (Annual Technical Conference) <43, 2000, Denver/Colo.> |
|
| English |
| Conference Paper |
| Fraunhofer IST () |
| dielectric barrier discharge; atmospheric pressure gas discharge; plasma deposition; corrosion protection |
Abstract
The report gives an account of applications of filamented dielectric barrier discharges to plasma-assisted film deposition at atmospheric pressure. It is demonstrated, that adhesion-promoting interlayers for organic coatings can be deposited on metals, yielding corrosion and adhesion performance comparable to state-of-the-art wet-chemical treatments. Using pulsed excitation of the discharge, plasma polymers with a high degree of retention of functional groups can be obtained.