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Characterisation of EUV damage thresholds and imaging performance of Mo/Si multilayer mirrors

 
: Müller, Matthias; Barkusky, Frank; Feigl, Torsten; Mann, Klaus

:

Juha, L. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Damage to VUV, EUV, and x-ray optics IV; and EUV and x-ray optics: Synergy between laboratory and space III : 15 - 18 April 2013, Prague, Czech Republic
Bellingham, WA: SPIE, 2013 (Proceedings of SPIE 8777)
ISBN: 978-0-8194-9579-2
Paper 877705
Conference "Damage to VUV, EUV, and X-Ray Optics" <4, 2013, Prague>
Conference "EUV and X-Ray Optics - Synergy between Laboratory and Space" <3, 2013, Prague>
English
Conference Paper
Fraunhofer IOF ()
extreme ultraviolet (EUV); laser damage; multilayer mirror; soft X-ray; wave front measurements and beam characterization

Abstract
We studied 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirrors, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ~ 60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Furthermore, we studied the radiationinduced change of reflectivity upon damage of a multilayer mirror. Additionally, we characterised transmission and reflection properties of novel Mo/Si multilayer beam splitters performing wavefront measurements with a Hartmann sensor at 13.5 nm wavelength. Such wavefront measurements allow also actinic investigations of thermal lens effects on EUV optics.

: http://publica.fraunhofer.de/documents/N-259796.html