Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Patterning flat and tilted 4H-SiC by Ga+ resistless lithography and subsequent reactive ion etching

Poster presented at MNE 2013, 39th International Conference on Micro- and Nano-Engineering 2013, London, United Kingdom
 
: Beuer, Susanne; Rommel, Mathias; Rumler, Maximilian; Haas, Anke; Bauer, Anton J.; Frey, Lothar

:
Fulltext urn:nbn:de:0011-n-2597103 (4.5 MByte PDF)
MD5 Fingerprint: 04796117af364c85de1898c7d7d0c560
Created on: 9.10.2013


2013
International Conference on Micro and Nano Engineering (MNE) <39, 2013, London>
English
Poster, Electronic Publication
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-259710.html