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Scattering reduction through oblique multilayer deposition

 
: Trost, Marcus; Schröder, Sven; Duparré, Angela; Tünnermann, Andreas

:

Optical Society of America -OSA-, Washington/D.C.:
Optical Interference Coatings (OIC) 2013. OSA Topical Meeting. Technical digest. CD-ROM : 16 - 21 June 2013, Whistler, British Columbia, Canada
Washington, DC: OSA, 2013
ISBN: 978-1-55752-970-1
Paper FC.4
Topical Meeting "Optical Interference Coatings" (OIC) <2013, Whistler>
English
Conference Paper
Fraunhofer IOF ()

Abstract
Scattering from multilayers depends on the roughness of each interface and their cross-correlation properties. Oblique deposition of thin films allows tailoring these properties and thus the scattering which will be illustrated for Mo/Si multilayers.

: http://publica.fraunhofer.de/documents/N-249749.html