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Roughness and Light Scattering of Ion-Beam-Sputtered Fluoride Coatings for 193 nm

: Ferre-Borrull, J.; Duparre, A.; Quesnel, E.


Applied optics 39 (2000), No.31, pp.5854-5864
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Journal Article
Fraunhofer IOF ()
thin film; optical properties; scattering measurement; scanning microscopy; UV; x-ray laser

Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.