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Combined ozone/HF/HCl based cleaning and adjusted emitter etch-back for silicon solar cells
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2013
Conference Paper
Titel
Combined ozone/HF/HCl based cleaning and adjusted emitter etch-back for silicon solar cells
Author(s)
Moldovan, Anamaria
Birmann, Katrin
Rentsch, Jochen
Zimmer, Martin
Gitte, T.
Fittkau, J.
Hauptwerk
Ultra clean processing of semiconductor surfaces XI
Konferenz
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2012
DOI
10.4028/www.scientific.net/SSP.195.305
Language
English
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Fraunhofer-Institut für Solare Energiesysteme ISE