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Nanoimprinted diffraction gratings for crystalline silicon solar cells

Implementation, characterization and simulation
: Mellor, A.; Hauser, H.; Wellens, C.; Benick, J.; Eisenlohr, J.; Peters, M.; Guttowski, A.; Tobias, I.; Marti, A.; Luque, A.; Bläsi, B.

Fulltext urn:nbn:de:0011-n-2418770 (3.0 MByte PDF)
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This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
Created on: 9.8.2014

Optics Express 21 (2013), No.5, pp.A295-A304
ISSN: 1094-4087
Bundesministerium für Bildung und Forschung BMBF
Journal Article, Electronic Publication
Fraunhofer ISE ()
Solarthermie und Optik; Silicium-Photovoltaik; Angewandte Optik und funktionale Oberflächen; Kristalline Silicium-Dünnschichtsolarzellen; Mikrostrukturierte Oberflächen; Industrielle und neuartige Solarzellenstrukturen; trapping; Nanoimprint

Light trapping is becoming of increasing importance in crystalline silicon solar cells as thinner wafers are used to reduce costs. In this work, we report on light trapping by rear-side diffraction gratings produced by nano-imprint lithography using interference lithography as the mastering technology. Gratings fabricated on crystalline silicon wafers are shown to provide significant absorption enhancements. Through a combination of optical measurement and simulation, it is shown that the crossed grating provides better absorption enhancement than the linear grating, and that the parasitic reflector absorption is reduced by planarizing the rear reflector, leading to an increase in the useful absorption in the silicon. Finally, electrooptical simulations are performed of solar cells employing the fabricated grating structures to estimate efficiency enhancement potential.