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Lifetime and refurbishment of multilayer LPP collector mirrors

: Feigl, Torsten; Perske, Marco; Pauer, Hagen; Fiedler, Tobias; Yulin, Sergiy; Kaiser, Norbert; Tünnermann, Andreas; Böwering, Nobert R.; Ershov, Alex I.; Dea, Silvia de; Hoffmann, Kay; Fontaine, Bruno la; Fomenkov, Igor V.; Brandt, David


Naulleau, P.P. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Extreme Ultraviolet (EUV) Lithography IV : 24 - 28 February 2013, San Jose, California
Bellingham, WA: SPIE, 2013 (Proceedings of SPIE 8679)
ISBN: 978-0-8194-9461-0
Paper 86790C
Conference "Extreme Ultraviolet (EUV) Lithography" <4, 2013, San Jose/Calif.>
Conference Paper
Fraunhofer IOF ()
EUV collector mirror; multilayer mirror coating; collector lifetime

The usable power of high-power EUV light sources at 13.5 nm and also the lifetime of source and collector optics are currently considered to be the largest challenges encountered during the transition of EUV lithography from the current beta-tool status to high-volume manufacturing. Fraunhofer IOF Jena has developed cost-effective refurbishment technologies of multilayer-based near normal incidence collector mirrors for high-power laser-produced plasma sources. Presently, the collector mirror lifetime exceeds 80 billion laser pulses which correspond to a lifetime of several months during continuous use of the source. Together with their partners Cymer is currently carrying out a focused program to improve the collector lifetime. New multilayer coatings together with new in-situ cleaning strategies during source operation are key technology development strategies to get closer to the ultimate target of about one year collector lifetime. The paper discusses different LPP collector refurbishment strategies and presents the recent status on collector refurbishment techniques.