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Novel industrial atmospheric pressure dry texturing procress for silicon solar cell improvement

: Dresler, B.; Köhler, D.; Mäder, G.; Kaskel, S.; Beyer, E.; Clochard, L.; Duffy, E.; Kafle, B.; Hofmann, M.; Rentsch, J.


Nowak, S. ; European Commission:
27th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2012. DVD-ROM : Proceedings of the international conference held in Frankfurt, Germany, 24 - 28 September 2012
München: WIP-Renewable Energies, 2012
ISBN: 3-936338-28-0
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <27, 2012, Frankfurt>
Conference Paper
Fraunhofer IWS ()
dry etching; silicon solar cell; texturisation; atmospheric pressure

The front texture of crystalline silicon solar cells plays a crucial role in order to effectively harvest light and transform it into electricity. In this paper, a novel technology based on dry atmospheric pressure etching is presented. It allows the single-sided inline etching of c-Si wafers using the global warming potential-free process gas fluorine (F2). Vast improvements of light trapping are already achieved leading to weighted reflection values below 8% without dielectric anti-reflection coating. The passivation of the relatively rough surfaces can most effectively be facilitated using ALD-Al2O3 films stacked with PECVD-SiNx layers. The paper presents SEM images of the surface structures and the basic setup principle of the new production tool.