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Framework for integration of virtual metrology and predictive maintenance

: Roeder, G.; Mattes, A.; Pfeffer, M.; Schellenberger, M.; Pfitzner, L.; Knapp, A.; Mühlberger, H.; Kyek, A.; Lenz, B.; Frisch, M.; Bichlmeier, J.; Leditzky, G.; Lind, E.; Zoia, S.; Fazio, G.


Institute of Electrical and Electronics Engineers -IEEE-; Semiconductor Equipment and Materials International -SEMI-, San Jose/Calif.:
23rd Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2012. Proceedings : May 15-17, 2012, Saratoga Springs, NY
Piscataway, NJ: IEEE, 2012
ISBN: 978-1-4673-0351-4
ISBN: 978-1-4673-0350-7 (Print)
Advanced Semiconductor Manufacturing Conference (ASMC) <23, 2012, Saratoga Springs/NY>
Conference Paper
Fraunhofer IISB ()

Within the ENIAC project "IMPROVE", new algorithms for virtual metrology and predictive maintenance are being developed to substantially enhance efficiency in European semiconductor manufacturing. The consortium comprises important IC manufacturers in Europe, solution providers, and research institutions. A major objective of the project is to make these new APC methods applicable in the existing fab systems of the IC manufacturers which widely differ in the automation infrastructure. A novel framework architecture for integration of the new control paradigms was researched and a software for implementation of the framework was developed. This paper describes the technical details and results of the framework development, implementation, and test.