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Origination of Nano-and Microsturctures on Large Areas by Interference Lithography

 
: Wolf, A.; Hauser, H.; Nitsche, M.; Kübler, V.; Walk, C.; Höhn, O.; Bläsi, B.

:

Microelectronic engineering 98 (2012), Special issue MNE 2011 - Part II, pp. 293-296
ISSN: 0167-9317
International Conference on Micro- and Nano-Engineering (MNE) <37, 2011, Berlin>
English
Conference Paper, Journal Article
Fraunhofer ISE ()
Solarthermie und Optik; Angewandte Optik und funktionale Oberflächen; Mikrostrukturierte Oberflächen

Abstract
Many markets require large area surface relief micro- and nanostructures. Important examples are light management structures for display applications or the radiation power management in solar systems. Structuring techniques with both up-scaling and mass production potential are an essential precondition for their realization.

Interference lithography is a promising technique to originate fine-tailored structures on areas of up to 1.2 × 1.2 m2. Subsequent replication techniques have the potential for enabling an industrial fabrication.

After a description of the basic technologies, we present application examples of large area structures used as template for polarization optical films. Furthermore, light trapping structures for crystalline silicon solar cells are shown. For this application, etching masks were fabricated by nanoimprint lithography. A subsequent etching step was applied to transfer the structures into the silicon. Finally, 3-dimensional photonic structures with distinguished optical properties are presented.

: http://publica.fraunhofer.de/documents/N-221082.html