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ALD of Metal and Metal Oxide Thin Films for Applications in ULSI Metallization Systems and Spintronic Layer Stacks
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2012
Conference Paper
Titel
ALD of Metal and Metal Oxide Thin Films for Applications in ULSI Metallization Systems and Spintronic Layer Stacks
Author(s)
Waechtler, T.
Mueller, S.
Fiedler, H.
Melzer, Marcel
Schulz, Stefan E.
Geßner, Thomas
Hauptwerk
Atomic Layer Deposition - Grundlagen, Anwendungen und künftige Potentiale
Konferenz
Workshop "Atomic Layer Deposition - Grundlagen, Anwendungen und künftige Potentiale" 2012
Language
English
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Fraunhofer-Institut für Elektronische Nanosysteme ENAS