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Hafnium titanium silicate high-k dielectric films deposited by MOCVD using novel single source precursors

 
: Zürcher, S.; Morstein, M.; Lemberger, M.; Bauer, A.J.

Allendorf, M.D. ; Electrochemical Society -ECS-, High Temperature Materials Division:
Chemical vapor deposition XVI and EUROCVD 14. Vol.2 : Proceedings of the international symposium. Sixteenth International Conference on Chemical Vapor Deposition was jointly held with the EUROCVD-14 Conference as part of 203rd Electrochemical Society meeting in Paris, France, April 27 - May 2, 2003
Pennington: Electrochemical Society, 2003 (Electrochemical Society. Proceedings 2003-8)
ISBN: 1-566-77380-6
ISBN: 1-566-77378-4
pp.863-870
International Conference on Chemical Vapor Deposition <16, 2003, Paris>
EUROCVD <14, 2003, Paris>
Electrochemical Society (Meeting) <203, 2003, Paris>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-21736.html