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Rigorous simulation of defective EUV multilayer masks

 
: Sambale, C.; Schmöller, T.; Erdmann, A.; Evanschitzky, P.; Kalus, C.

Kimmel, K.R. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
23rd Annual BACUS Symposium on Photomask Technology 2003. Pt.2 : 9 - 12 September 2003, Monterey, California, USA
Bellingham/Wash.: SPIE, 2003 (SPIE Proceedings Series 5256)
ISBN: 0-8194-5143-6
pp.1239-1248
Symposium on Photomask Technology <23, 2003, Monterey/Calif.>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-21732.html