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Rigorous simulation of defective EUV multilayer masks
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2003
Conference Paper
Titel
Rigorous simulation of defective EUV multilayer masks
Author(s)
Sambale, C.
Schmöller, T.
Erdmann, A.
Evanschitzky, P.
Kalus, C.
Hauptwerk
23rd Annual BACUS Symposium on Photomask Technology 2003. Pt.2
Konferenz
Symposium on Photomask Technology 2003
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB