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Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents
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2003
Conference Paper
Titel
Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents
Author(s)
Jank, M.
Frey, L.
Bauer, A.J.
Ryssel, H.
Hauptwerk
Ion implantation technology, IIT 2002
Konferenz
International Conference on Ion Implantation Technology (IIT) 2002
DOI
10.1109/IIT.2002.1257972
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB