Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Simulation of extreme ultraviolet masks with defective multilayers

 
: Evanschitzky, P.; Erdmann, A.; Besacier, M.; Schiavone, P.

:

Tanabe, H. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Photomask and next-generation lithography mask technology X : Invited and contributed papers presented at Photomask Japan 2003. 16 - 18 April 2003, Yokohama, Japan
Bellingham/Wash.: SPIE, 2003 (SPIE Proceedings Series 5130)
ISBN: 0-8194-4996-2
pp.1035-1045
Conference "Photomask Japan" <2003, Yokohama>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-21717.html