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Pulsed arc deposition of super-hard amorphous carbon films

: Schulz, H.; Scheibe, H.-J.; Siemroth, P.; Schultrich, B.


Applied physics. A 78 (2004), No.5, pp.675-679
ISSN: 0340-3793
ISSN: 0721-7250
ISSN: 0947-8396 (Print)
ISSN: 1432-0630 (Online)
Journal Article
Fraunhofer IWS ()

Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown.