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EUV damage threshold measurements of Mo/Si multilayer mirrors

 
: Müller, Matthias; Barkusky, Frank; Feigl, Torsten; Mann, Klaus

:

Applied physics. A 108 (2012), No.2, pp.263-267
ISSN: 0340-3793
ISSN: 0721-7250
ISSN: 0947-8396 (Print)
ISSN: 1432-0630 (Online)
English
Journal Article
Fraunhofer IOF ()

Abstract
We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is about 60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Additionally, we studied the radiation-induced change of reflectivity upon damage of a multilayer mirror.

: http://publica.fraunhofer.de/documents/N-214564.html