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Verfahren zur Herstellung eines Siliziumschicht

METHOD FOR PRODUCING A SILICON LAYER
 
: Jank, M.; Lukas, S.

:
Frontpage ()

DE 102011008263 A
German
Patent, Electronic Publication
Fraunhofer IISB ()

Abstract
The invention relates to a method for producing a silicon layer, wherein silicon nanoparticles are sintered using a catalyst, preferably nickel. In said method, nanoparticles containing or made of silicon are applied to a substrate, the nanoparticles are brought together with nickel or a compound containing nickel, and then the nanoparticles and the nickel or the compound containing nickel are heated in such a way that a continuous silicon layer is produced by means of tempering.

: http://publica.fraunhofer.de/documents/N-214501.html