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Antireflective nanostructures for low-index substrates

: Schulz, Ulrike; Munzert, Peter; Kaiser, Norbert

Meinema, H.A. (Hrsg.) ; International Council for Coatings on Glass e.V. -ICCG-:
ICCG 2012, Proceedings 9th International Conference on Coatings on Glass and Plastics : June 24-28, 2012, Breda, The Netherlands
Breda, 2012
ISBN: 978-905986-404-7
International Conference on Coatings on Glass and Plastics (ICCG) <9, 2012, Breda>
Conference Paper
Fraunhofer IOF ()
anti-reflection; nanostructure; plasma-etching

Antireflective structures (ARS) with features of sub-wavelength size are appropriate as an alternative to interference coatings for obtaining antireflective properties on optical surfaces. A nanostructured surface can act either as an effective layer with a more or less constant low effective index or as a graded-refractive-index (GRIN) layer with decreasing index from substrate side to the ambient medium. In any case, for broadband antireflection or a wide range of incidence angles, a distinct thickness of the layer together with a very low structure size is required, which is especially difficult to realize on low-index substrates. A combination of interference layers with a nanostructured top-layer may help to overcome this problem.