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High aspect ratio deep UV wire grid polarizer fabricated by double patterning

: Weber, Thomas; Käsebier, Thomas; Szeghalmi, Adriana; Knez, Mato; Kley, Ernst-Bernhard; Tünnermann, Andreas


Microelectronic engineering 98 (2012), pp.433-435
ISSN: 0167-9317
International Conference on Micro- and Nano-Engineering (MNE) <37, 2011, Berlin>
Journal Article, Conference Paper
Fraunhofer IOF ()
double patterning; e-beam lithography; nanooptics

In this paper we present the fabrication of wire grid polarizers by double patterning based on ultra fast electron beam lithography and sophisticated deposition techniques. For an application in the deep UV spectral range a grating period of 100 nm and an aspect ratio of about 1:5 is essential. The grating materials aluminum, iridium, and tungsten as well as different deposition techniques were applied and compared. Furthermore, the optical function of the fabricated elements is determined in a large spectral range down to a wavelength of 193 nm.