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Novel approach for the creation of photocatalytic thin films by plasma curing of TiO2 containing dispersion of non-reactive siloxanes

 
: Ott, M.; Dölle, C.; Danilov, V.; Hartwig, A.; Meichsner, J.; Salz, D.; Schmüser, C.; Schorsch, O.; Sebald, M.; Wagner, H.E.E.; Vissing, K.D.

Blasek, G. ; Dresdner Transferstelle für Vakuumtechnik, Dresden:
Beschichtung, Modifizierung und Charakterisierung von Polymeroberflächen. 19. Neues Dresdner Vakuumtechnisches Kolloquium 2011 : Proceedings; 19.-20.10.2011, Dresden
Dresden, 2011
ISBN: 978-3-9812550-3-4
pp.80-84
Neues Dresdner Vakuumtechnisches Kolloquium (NDVaK) <19, 2011, Dresden>
German
Conference Paper
Fraunhofer IFAM ()

Abstract
A novel concept of for the creation of mechanically stable photocatalytic thin films by plasma curing of TiO2 containing dispersions of non-reactive siloxanes was presented. The photocatalytic activity of the coating was confirmed by the degradation of methylene-blue. This coating technology is not limited to flat substrates and can be applied for modified TiO2 particles, e.g. for photocatalytic effect with visible light. It was also demonstrated that etching with CF4 plasma enhances the photocatalytic activity up to a reduction of average layer thickness of 50 nm. This new approach will enable to create mechanically stable thin films of nanoparticle dispersions with an average film thickness up to 350 nm. Further applications like antimicrobial thin films with incorporated nano silver particles should also be possible.

: http://publica.fraunhofer.de/documents/N-212509.html