Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Effect of HfO2 polycrystallinity on distribution of the CAFM-induced TDDB in high-k gate stacks

Poster at 17th Workshop on Dielectrics in Microelectronics, June 25-27, 2012, Dresden
 
: Iglesias, V.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Porti, M.; Martin-Martinez, J.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Bersuker, G.

:
Poster urn:nbn:de:0011-n-2124646 (448 KByte PDF)
MD5 Fingerprint: d4df2ff450c9baf0a93c517c9b1dba48
Created on: 4.9.2012


2012, 1 Folie
Workshop on Dielectrics in Microelectronics (WoDiM) <17, 2012, Dresden>
English
Poster, Electronic Publication
Fraunhofer IISB ()
conductive AFM; cAFM; high-k; dielectric breakdown; TDDB; grain; grain boundary

: http://publica.fraunhofer.de/documents/N-212464.html