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UV-enhanced substrate conformal imprint lithography using an epoxy based polymer

Poster at NNT 2011, 10th International Conference on Nanoimprint and Nanoprint Technology, 19.10.-21.10.2011, The Shilla Jeju, Korea
 
: Fader, R.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Ji, R.; Hornung, M.; Brehm, M.; Kraft, A.

:
Poster urn:nbn:de:0011-n-2124631 (387 KByte PDF)
MD5 Fingerprint: 6b7cf6242dfc51a31dc051d55f806bf3
Created on: 4.9.2012


2011, 1 Folie
International Conference on Nanoimprint and Nanoprint Technology (NNT) <10, 2011, Jeju/Korea>
English
Poster, Electronic Publication
Fraunhofer IISB ()
substrate conformal imprint lithography; SCIL; soft lithography; UV curing epoxides; PDMS stamp

: http://publica.fraunhofer.de/documents/N-212463.html