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Novel polymers for UV-enhanced substrate conformal imprint lithography

Poster at MNE 2011, 37th International Conference on Micro&Nano Engineering 2011, 19.09.-23.09.2011, Berlin, Germany
 
: Fader, R.; Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Ji, R.; Hornung, M.; Brehm, M.; Vogler, M.

:
Poster urn:nbn:de:0011-n-2124615 (3.4 MByte PDF)
MD5 Fingerprint: c373638f57e5d2897e170b16db850ac2
Created on: 4.9.2012


2011, 1 Folie
International Conference on Micro- and Nano-Engineering (MNE) <37, 2011, Berlin>
English
Poster, Electronic Publication
Fraunhofer IISB ()
substrate conformal imprint lithography; SCIL; soft lithography; UV curing epoxides; PDMS stamp

: http://publica.fraunhofer.de/documents/N-212461.html