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Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy

Poster at WoDiM 2010, 16th Workshop on Dielectric Materials 2010, 28.06.-30.06.2010, Bratislava, Slovak Republic
 
: Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.

:
Poster urn:nbn:de:0011-n-2124569 (974 KByte PDF)
MD5 Fingerprint: bc25b545406446a8cbe891c59c74c9ac
Created on: 4.9.2012


2010, 1 Folie
Workshop on Dielectrics in Microelectronics (WoDiM) <16, 2010, Bratislava>
English
Poster, Electronic Publication
Fraunhofer IISB ()
high-k dielectric thin films; scanning probe microscopy; silicon compounds; surface roughness; zirconium oxide; silicon oxide

: http://publica.fraunhofer.de/documents/N-212456.html