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Characterization of thickness variations of thin dielectric layers at a nanoscale using Scanning Capacitance Microscopy

Poster at WoDiM 2010, 16th Workshop on Dielectric Materials 2010, 28.06.-30.06.2010, Bratislava, Slovak Republic
: Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.

Poster urn:nbn:de:0011-n-2124569 (974 KByte PDF)
MD5 Fingerprint: bc25b545406446a8cbe891c59c74c9ac
Created on: 4.9.2012

2010, 1 Folie
Workshop on Dielectrics in Microelectronics (WoDiM) <16, 2010, Bratislava>
Poster, Electronic Publication
Fraunhofer IISB ()
high-k dielectric thin films; scanning probe microscopy; silicon compounds; surface roughness; zirconium oxide; silicon oxide