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Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors

: Soer, W.A.; Herpen, M.M.J.W. van; Jak, M.J.J.; Gawlitza, P.; Braun, S.; Salashchenko, N.N.; Chkhalo, N.I.; Banine, V.Y.


Journal of micro/nanolithography, MEMS and MOEMS 11 (2012), No.2, Art.021118
ISSN: 1537-1646
ISSN: 1932-5150
ISSN: 1932-5134
Journal Article
Fraunhofer IWS ()

We have investigated the use of atomic-hydrogen-based cleaning to remove Sn contamination from extreme ultraviolet (EUV) multilayer mirrors. Mo and Si surfaces were cleaned at a relatively slow rate due to catalyzed dissociation of tin hydride on these surfaces. Mo/Si mirrors with B4C and Si3N4 cap layers and DLC-terminated DLC/Si mirrors showed complete removal of 10 nm Sn in 20 sec with full restoration of EUV reflectance. In addition, a prolonged cleaning treatment of 300 sec of a DLC/Si mirror resulted in only a minor EUV peak reflection loss of 1.2% absolute and no significant changes in infrared reflectance.