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A large area production technology for solar cells - sputter deposition of SiN:H

 
: Ruske, M.; Liu, J.; Wieder, S.; Preu, R.; Wolke, W.

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Fulltext urn:nbn:de:0011-n-2098551 (823 KByte PDF)
MD5 Fingerprint: 39d56fb2cd207a8639aaea32381db01d
Created on: 12.10.2012


20th European Photovoltaic Solar Energy Conference 2005. Proceedings : Barcelona, 6-10 June 2005
München: WIP-Renewable Energies, 2005
ISBN: 3-936338-19-1
pp.1470-1473
European Photovoltaic Solar Energy Conference <20, 2005, Barcelona>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Abstract
This paper summarizes aspects and investigations of the sputter process for industrial deposition of passivating SiN:H antireflection (AR) layers on multi-crystalline silicon solar cells. The motivation for this work was the existence of low cost mass products manufactured with sputtering technology such as coated architectural and display glass. In close cooperation with Applied Films, Fraunhofer ISE showed that sputtered nitride layers can replace the up to now used PECVD nitrides. The inherent advantages of sputtering technology such as excellent layer homogeneity, a silane-free process and long service cycles can be transferred to SiN:H deposition on solar cells. Operating figures for a newly designed inline sputter coater are presented.

: http://publica.fraunhofer.de/documents/N-209855.html