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Single side etching - key technology for industrial high efficiency processing

 
: Rentsch, J.; Gautero, L.; Lemke, A.; Eigner, S.; Zimmer, M.; Walter, F.; Hofmann, M.; Preu, R.

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Fulltext urn:nbn:de:0011-n-2098252 (134 KByte PDF)
MD5 Fingerprint: 82791386de240fd838d5d351fcb6f98e
Created on: 6.9.2012


Lincot, D. ; European Commission, Joint Research Centre -JRC-:
The compiled state-of-the-art of PV solar technology and deployment. 23rd European Photovoltaic Solar Energy Conference, EU PVSEC 2008. Proceedings. CD-ROM : Held in Valencia, Spain, 1 - 5 September 2008; Proceedings of the international conference
München: WIP-Renewable Energies, 2008
ISBN: 3-936338-24-8
ISBN: 978-3-936338-24-9
pp.1889-1892
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <23, 2008, Valencia>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Abstract
Single side etching technologies will gain more and more importance when high efficiency cell structures with passivated and locally contacted rear side will enter industrial production. Within this paper different etching approaches for the solar cells rear, either dry or wet chemically, have been investigated in terms of resulting surface topography, and, combined with subsequent PECVD stack passivation, in terms of surface recombination velocity and optical performance. Correlations between surface roughness, surface recombination velocity and final Voc potential have been taken. Thin (130 µm) passivated and locally LFC contacted Cz-Si solar cells have been processed implementing the different etching sequences reaching up to 4 % relative higher short circuit currents compared to Al-BSF reference cells with maximum efficiency of 16.2 %.

: http://publica.fraunhofer.de/documents/N-209825.html