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Honeycomb textured multicrystalline silicon via nanoimprint lithography

 
: Hauser, H.; Voisin, P.; Guttowski, A.; Mick, J.; Pfeifer, M.; Müller, C.; Hermle, M.; Glunz, S.; Bläsi, B.

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Fulltext urn:nbn:de:0011-n-2096060 (489 KByte PDF)
MD5 Fingerprint: a6cf48ed2655eca42c11b4ef04834e3c
Created on: 17.8.2012


Sinke, W. ; WIP - Renewable Energies, München; European Commission; UNESCO; World Council for Renewable Energy; International Photovoltaic Equipment Association:
24th European Photovoltaic Solar Energy Conference 2009. CD-ROM : The compiled State-of-the-Art of PV Solar Technology and Deployment. Proceedings of the International Conference held in Hamburg, 21-25 September 2009
München, 2009
ISBN: 3-936338-25-6
pp.1118-1122
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <24, 2009, Hamburg>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Abstract
A new approach for realizing a defined texture on multicrystalline silicon for solar cells was investigated. The necessary etching mask is structured via UV-Nanoimprint Lithography as a potential substitute for photolithography. This emerging technology offers new possibilities in terms of resolution, shape of the structured patterns and requirements to the substrate´s surface quality. After the UV sensitive resist is structured and cross-linked, it serves as etching mask within a reactive ion etching process. To evaluate the quality of the textured surfaces, optical as well as electrical characterisation was conducted.

: http://publica.fraunhofer.de/documents/N-209606.html