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Industrially feasible front-side metallization based on ink-jet masking and nickel plating

 
: Aleman, M.; Bay, N.; Gautero, J.; Specht, J.; Stüwe, D.; Neubauer, R.; Baurcha, D.; Biro, D.; Rentsch, J.; Glunz, S.W.; Preu, R.

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Fulltext urn:nbn:de:0011-n-2094566 (477 KByte PDF)
MD5 Fingerprint: a322712f7c48d08af2735239a2ada87b
Created on: 5.9.2012


Lincot, D. ; European Commission, Joint Research Centre -JRC-:
The compiled state-of-the-art of PV solar technology and deployment. 23rd European Photovoltaic Solar Energy Conference, EU PVSEC 2008. Proceedings. CD-ROM : Held in Valencia, Spain, 1 - 5 September 2008; Proceedings of the international conference
München: WIP-Renewable Energies, 2008
ISBN: 3-936338-24-8
ISBN: 978-3-936338-24-9
pp.1953-1956
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <23, 2008, Valencia>
English
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Abstract
An alternative for an industrial front side metallization process for silicon solar cells is presented in this paper. Using ink-jet printing of a resist and wet-chemical acidic etching a structure is formed into the anti-reflection coating. The metallization is performed in two steps: first the formation of a seed layer by electroless nickel plating, followed by the growth of the contacts through light-induced silver plating. An evaluation of different steps in the process, like etching of the SiNx and formation of the silicide, is presented here. Industrial solar cells investigated in this paper show jsc ~35 mA/cm2, Fill Factor ~77 % and efficiencies up to 16.7 %.

: http://publica.fraunhofer.de/documents/N-209456.html