Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Advances in electroless nickel plating for the metallization of silicon solar cells using different structuring techniques for the ARC
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Fulltext urn:nbn:de:0011-n-2094556 (432 KByte PDF) MD5 Fingerprint: 787c076e3ffdefd09d96415219216249 Created on: 11.8.2012 |
| Sinke, W. ; WIP - Renewable Energies, München; European Commission; UNESCO; World Council for Renewable Energy; International Photovoltaic Equipment Association:
24th European Photovoltaic Solar Energy Conference 2009. CD-ROM : The compiled State-of-the-Art of PV Solar Technology and Deployment. Proceedings of the International Conference held in Hamburg, 21-25 September 2009
München, 2009
ISBN: 3-936338-25-6
pp.1414-1418 |
| European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <24, 2009, Hamburg> |
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| English |
| Conference Paper, Electronic Publication |
| Fraunhofer ISE () |
Abstract
This paper demonstrates the results of a seed and plate technology, based on electroless nickel on industrial substrates. Through a photoassisted surface activation of the solar cells homogeneous NiP coatings about 30-50 nm thick have been deposited. The combination of this step with inkjet masking and etching has been compared with laser ablation and with standard screen printed cells on standard industrial solar cells. An improvement of 0.5% absolute in efficiency has been achieved thanks to the use of nickel contacts. The advantages and disadvantages of each structuring process are presented. The evaluation of the laser ablation + nickel process on high efficiency structures has delivered FF over 80%.