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Plasmachemisches Ätzen und Beschichten bei Atmosphärendruck: Anwendungen in der kristallinen Siliziumphotovoltaik

Atmospheric pressure plasma-chemical etching and deposition. Application in crystalline silicon photovoltaics
: Lopez, E.; Linaschke, D.; Dresler, B.; Dani, I.; Leyens, C.; Beyer, E.


Vakuum in Forschung und Praxis 23 (2011), No.6, pp.12-16
ISSN: 0947-076X
ISSN: 1522-2454
Journal Article
Fraunhofer IWS ()

For industrial processing of wafer based crystalline silicon solar cells a variety of different technologies are applied. The combination of these requires a complex wafer handling; increasing not only investment costs, but also the risk of wafer breakage. Application of plasma technologies offers the possibility to manufacture crystalline silicon solar cells without any wet chemical or vacuum processes. At Fraunhofer IWS all etching steps necessary for the production of solar cells and the deposition of silicon nitride as passivation and anti-reflection coating were demonstrated successfully using atmospheric pressure plasma technologies.