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Nanoscale characterization of TiO2 films grown by atomic layer deposition

Poster at 17th Workshop on Dielectrics in Microelectronics, June 25-27, 2012, Dresden
 
: Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Hudec, Boris; Rosova, A.; Hueková, K.; Fröhlich, Karol; Kasikov, A.; Ramula, R.; Aarik, J.; Han, J.H.; Han, S.; Lee, W.; Song, S.J.; Hwang, C.S.

:
Poster urn:nbn:de:0011-n-2084669 (1.4 MByte PDF)
MD5 Fingerprint: 45c19e54e15c18733fe24df926a3c0e1
Created on: 19.7.2012

Poster urn:nbn:de:0011-n-208466-17 (1.3 MByte PDF) - korrigierte Fassung
MD5 Fingerprint: 636b0eca2ae487fbf873811d32bf5085
Created on: 16.10.2012


2012, 1 Folie
Workshop on Dielectrics in Microelectronics (WoDiM) <17, 2012, Dresden>
English
Poster, Electronic Publication
Fraunhofer IISB ()
tunneling AFM; TUNA; conductive AFM; cAFM; high-k; grain and grain boundary; TiO2; leakage current

: http://publica.fraunhofer.de/documents/N-208466.html