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Coatings of Ti and TiO2 with defined roughness for implants by gas flow sputtering

 
: Lembke, U.; Körtge, A.; Neumann, H.-G.; Ortner, K.; Jung, T.; Lange, R.; Beck, U.

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The Minerals, Metals and Materials Society -TMS-, Warrendale/Pa.:
THERMEC 2011, 7th International Conference on Processing and Manufacturing of Advanced Materials : Held during August 1-5, 2011 in Quebec City, Canada
Dürnten: Trans Tech Publications, 2012 (Materials Science Forum 706-709)
ISBN: 978-3-03-785303-0
pp.443-448
International Conference on Processing and Manufacturing of Advanced Materials (THERMEC) <7, 2011, Quebec>
English
Conference Paper
Fraunhofer IST ()
gas flow sputtering; coating; implant; Ti; TiO2; defined roughness; SEM

Abstract
High rate film deposition via Gas Flow Sputtering was used to develop both metallic titanium films and ceramic titania coatings for implants. The structure formation of the coatings can be described by a modified model of structure zones according to Thornton. The potential of Gas Flow Sputtering for designing implant surfaces with controlled morphology and roughness is demonstrated.

: http://publica.fraunhofer.de/documents/N-206948.html