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Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks

: Filatova, E.O.; Kozhevnikov, I.V.; Sokolov, A.A.; Ubyivovk, E.V.; Yulin, S.; Gorgoi, M.; Schäfers, F.

Postprint (PDF; )

Science and technology of advanced materials 13 (2012), No.1, Art. 015001, 12 pp.
ISSN: 1468-6996
Journal Article, Electronic Publication
Fraunhofer IOF ()
titanium dioxide; metallic titanium; thin films; interface; soft x-ray reflectometry (SXR); HXPES; HRTEM

We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO 2/SiO 2/Si and Ti/SiO 2/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity curves measured versus the incidence angle at different soft x-ray reflection (SXR) photon energies. The results were confirmed by the conventional techniques of hard x-ray photoelectron spectroscopy (HXPES) and high-resolution transmission electron microscopy (HRTEM). The depth variation of the chemical composition, thicknesses and densities of individual layers extracted from SXR and HXPES measurements are in close agreement and correlate well with the HRTEM images.