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Reliable quantification of inorganic contamination by TXRF

 
: Müller, M.; Nutsch, A.; Altmann, R.; Borionetti, G.; Holz, T.; Mantler, C.; Hönicke, P.; Kolbe, M.; Beckhoff, B.

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Mertens, P. ; Interuniversity Micro-Electronics Center -IMEC-, Louvain:
Ultra clean processing of semiconductor surfaces X : Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20 - 22, 2010, Ostend, Belgium
Durnten-Zurich: TTP, 2012 (Solid state phenomena 187)
ISBN: 978-3-03-785388-7
ISSN: 1012-0394
pp.291-294
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) <10, 2010, Ostende>
English
Conference Paper
Fraunhofer IISB ()

Abstract
The European Integrated Activity of Excellence and Networking for nanoand Micro-Electronics Analysis (ANNA), www.ANNA-i3.net, has addressed the further development and assessment of methodologies for the detection of low concentration inorganic contaminants on and in silicon as well as for novel materials. The comparison of various analytical techniques available to the ANNA partners helped to identify the degree of comparableness of results revealed at different installations. The assessment of improved methodologies as well as the reliability of quantification and calibration procedures of specific analytical techniques such as Total-Reflection X-ray Fluorescence (TXRF) analysis has been of particular interest.

: http://publica.fraunhofer.de/documents/N-206626.html