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Simple wet-chemical cleanings for high-efficiency silicon solar cell applications

 
: Breitenstein, L.; Sevenig, F.; Pysch, D.; Gottschalk, C.; Hermle, M.; Warta, W.

:

Mertens, P. ; Interuniversity Micro-Electronics Center -IMEC-, Louvain:
Ultra clean processing of semiconductor surfaces X : Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20 - 22, 2010, Ostend, Belgium
Durnten-Zurich: TTP, 2012 (Solid state phenomena 187)
ISBN: 978-3-03-785388-7
ISSN: 1012-0394
pp.325-328
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) <10, 2010, Ostende>
English
Conference Paper
Fraunhofer ISE ()
Solarzellen - Entwicklung und Charakterisierung; Silicium-Photovoltaik; Oberflächen - Konditionierung; Passivierung; Lichteinfang; Herstellung und Analyse von hocheffizienten Solarzellen; Industrielle und neuartige Solarzellenstrukturen

Abstract
Simple two-step wet-chemical cleans composed of an oxidizing step with in water dissolved ozone followed by an etching step have been studied for high-efficient hetero-junction silicon solar cell applications. For this purpose flat Si(111) samples passivated with amorphous silicon have been investigated. The effect of nano-roughness of the crystalline silicon surface on the minority carrier lifetime is shown. An influence of the storage time between cleaning and a-Si:H deposition was found and can partly be attributed to changes in surface roughness and native oxide growth.

: http://publica.fraunhofer.de/documents/N-206623.html