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Reference samples for ultra trace analysis of organic compounds on substrate surfaces

: Nutsch, A.; Beckhoff, B.; Borionetti, G.; Codegoni, D.; Grasso, S.; Hoenicke, P.; Leibold, A.; Müller, M.; Otto, M.; Pfitzner, L.; Polignano, M.-L.


Mertens, P. ; Interuniversity Micro-Electronics Center -IMEC-, Louvain:
Ultra clean processing of semiconductor surfaces X : Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20 - 22, 2010, Ostend, Belgium
Durnten-Zurich: TTP, 2012 (Solid state phenomena 187)
ISBN: 978-3-03-785388-7
ISSN: 1012-0394
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) <10, 2010, Ostende>
Conference Paper
Fraunhofer IISB ()

Reference samples were produced for development, benchmarking and comparison of analytical techniques based on mass spectroscopy as TD-GCMS and TOF-SIMS and x-ray analysis as TXRF-NEXAFS. Organic contaminants representing plasticizers, disinfectants and flame retardants were chosen. The contaminants were selected with respect to reliable detection using the above analytical techniques. The stability of the reference samples produced with dethylphtalate, triclosane, and tetrabrombisphenol A on silicon stripes or wafers with a diameter of 200 mm was found to be approx. 10 days. The comparison of the techniques showed that the mass spectroscopy methods allowed reliable qualification of organic surface contamination. TD-GCMS quantifies and identifies the volatile organic compounds whereas TXRF quantifies the carbon contamination, especially the non-volatile, on sample surfaces.