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Mutual source, mask and projector pupil optimization

 
: Fühner, T.; Evanschitzky, P.; Erdmann, A.

:

Conley, W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical microlithography XXV : 13 - 16 February 2012, San Jose, California
Bellingham, WA: SPIE, 2012 (Proceedings of SPIE 8326)
ISBN: 978-0-8194-8982-1
Paper 83260I
Conference "Optical Microlithography" <25, 2012, San Jose/Calif.>
SPIE advanced lithography <2012, San Jose>
English
Conference Paper
Fraunhofer IISB ()

Abstract
This paper presents a combined source/mask/projector pupil optimization (SMPO) procedure, aiming at the maximization of the common process window of different line/space configurations. The parameters are given by a pixelated source representation, sizes of the main features and the SRAF configuration. The projector wavefront is varied through the coefficients of the Fringe-Zernike polynomials for spherical aberrations. A genetic algorithm is applied as the underlying optimization algorithm. A number of results are presented and discussed, demonstrating the feasibility and potentials of the approach.

: http://publica.fraunhofer.de/documents/N-206425.html