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Nondestructive topographic resistivity evaluation of semi-insulating SiC substrates

Zerstörungsfreie topografische Widerstandsmessung semi-isolierender SIC-Substrate
: Stibal, R.; Müller, S.; Jantz, W.; Pozina, G.; Magnusson, B.; Ellison, A.


Physica status solidi. C (2003), No.3, pp.1013-1018
ISSN: 1610-1634
ISSN: 1610-1642
ISSN: 1862-6351
Journal Article
Fraunhofer IAF ()
resistivity; spezifischer Widerstand; semi-insulating; semi-isolierend; substrat; SiC; topography; Topographie; measurement; HTCVD; crystal growth; Kristallzucht

Semi-insulating silicon carbide single crystals have been grown using high temperature chemical vapor deposition without vanadium doping. The resistivity of standard and exploratory 2" diameter substrates has been analysed topographically with 1 mm lateral resolution with an improved contactless resistivity mapping technique. Absolute resistivity values are ranging from below 1 x 10(exp5) to above 1 x 10(exp12) ohm cm. The lateral homogeneity of state-of-the-art material is very satisfactory, whereas strong localized inhomogeneities in exploratory materials underscore the decisive advantage of a nondestructive and topographic resistivity evaluation in supporting the optimization of the crystal growth procedure.