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Optical properties of thin Ag films deposited by magnetron sputtering

: Charton, C.; Fahland, M.


Surface and coatings technology 174-175 (2003), pp.181-186
ISSN: 0257-8972
International Conference on Plasma Surface Engineering <8, 2002, Garmisch-Partenkirchen>
Conference Paper
Fraunhofer FEP ()
Ag; optical properties; magnetron sputtering

Thin Ag films grown under varying deposition conditions are analysed by means of photometric measurements. From these measurements the values for n and k are c alculated. The films are deposited onto a polyethylene terephthalate (PET) web by DC magnetron sputtering. It is examined to which extent the deposition conditions influence the optical properties of the Ag films. Below a certain critical thickness d, which is highly-dependent on the sputtering pressure, deviations between the bulk and the occalculated values, for the complex refractive index occur. This can be attributed to the growth mode of the Ag films, which is VolmerWeber-like and a closed film is not formed until the critical thickness d is reached.